DocumentCode
2577316
Title
Step and repeat photo-nanoimprint system using active orientation head
Author
Hiroshima, H. ; Komuro, M. ; Kurashima, Y. ; Kim, S. ; Muneishi, T.
Author_Institution
Adv. Semicond. Res. Center, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
56
Lastpage
57
Abstract
In this paper, we have designed a new active orientation head for compliant contact and constructed a new step and repeat photo-nanoimprint system using the orientation head.
Keywords
nanolithography; photolithography; active orientation head; compliant contact; photo-nanoimprint system; step and repeat system; Actuators; Analog circuits; Analog computers; Bars; Fabrication; Fasteners; Feedback circuits; Plasma welding; Process design;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268516
Filename
1268516
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