• DocumentCode
    2577316
  • Title

    Step and repeat photo-nanoimprint system using active orientation head

  • Author

    Hiroshima, H. ; Komuro, M. ; Kurashima, Y. ; Kim, S. ; Muneishi, T.

  • Author_Institution
    Adv. Semicond. Res. Center, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    56
  • Lastpage
    57
  • Abstract
    In this paper, we have designed a new active orientation head for compliant contact and constructed a new step and repeat photo-nanoimprint system using the orientation head.
  • Keywords
    nanolithography; photolithography; active orientation head; compliant contact; photo-nanoimprint system; step and repeat system; Actuators; Analog circuits; Analog computers; Bars; Fabrication; Fasteners; Feedback circuits; Plasma welding; Process design;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268516
  • Filename
    1268516