Title :
Step and repeat photo-nanoimprint system using active orientation head
Author :
Hiroshima, H. ; Komuro, M. ; Kurashima, Y. ; Kim, S. ; Muneishi, T.
Author_Institution :
Adv. Semicond. Res. Center, Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
Abstract :
In this paper, we have designed a new active orientation head for compliant contact and constructed a new step and repeat photo-nanoimprint system using the orientation head.
Keywords :
nanolithography; photolithography; active orientation head; compliant contact; photo-nanoimprint system; step and repeat system; Actuators; Analog circuits; Analog computers; Bars; Fabrication; Fasteners; Feedback circuits; Plasma welding; Process design;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268516
