Title :
A detection method for a T-topped profile in resist patterns by top-down-view CD-SEM
Author :
Yamaguchi, A. ; Fukuda, H. ; Komuro, O. ; Yoneda, S. ; Iizumi, T.
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
Abstract :
In this paper, we have evaluated the characteristics of T-topped patterns with LER, the width of the white band, and a correlation coefficient between the left and right borders of the white band. It can be concluded that the evaluation of these features enables us to recognize a T-topped profile of a resist-pattern edge from only one top-down image by CD-SEM.
Keywords :
resists; scanning electron microscopy; surface roughness; CD-SEM; T-topped profile; resist-pattern edge; top-down image; white band; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268522
