DocumentCode :
2577630
Title :
Structural characterization of Mo/Ru/Si EUV reflector by optical modeling
Author :
In-Yong Kang ; Tae Geun Kim ; Seung Yoon Lee ; Jinho Ahn ; Yong-Chae Chung
Author_Institution :
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
fYear :
2003
fDate :
29-31 Oct. 2003
Firstpage :
92
Lastpage :
93
Abstract :
The performance of multilayer extreme ultraviolet (EUV) reflector has direct bearing on the process throughput and cost of new technology. Using measured data from the experimentally manufactured reflector, we intended, in this work, to show that the reflectivity of the Bragg reflector can be characterized by structural parameters such as d-spacing, density, and the thickness of inter-diffusion layers and oxidation layer. This quantitative analysis of the reflectivity derived from the structural parameters can be utilized to optimize the optical properties of the existing Mo/Ru/Si system as well as to provide fundamental insights into the science involved in a Bragg EUV reflector.
Keywords :
chemical interdiffusion; distributed Bragg reflectors; elemental semiconductors; molybdenum; optical multilayers; oxidation; reflectivity; ruthenium; silicon; ultraviolet lithography; Bragg EUV reflector; Bragg reflector; Mo-Ru-Si; Mo/Ru/Si EUV reflector; Mo/Ru/Si system; d-spacing; density; inter-diffusion layers; multilayer extreme ultraviolet reflector; optical modeling; optical properties; oxidation layer; reflectivity; Costs; Density measurement; Manufacturing; Nonhomogeneous media; Oxidation; Reflectivity; Structural engineering; Thickness measurement; Throughput; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
Type :
conf
DOI :
10.1109/IMNC.2003.1268534
Filename :
1268534
Link To Document :
بازگشت