Direct drawing for microfabrication without photolithography

This paper proposes fabrication process using a direct drawing without photolithography. Metal structuring is focused on because it used to be difficult to form metal structures by printing methods. Drawing a kind of amino silane coupler as a seed material of a non-electroplating is proposed in order to form metal patterns. Drawing of photoresist patterns as an example of the nonmetallic material also performed successfully. It becomes possible to form photoresist patterns as etching masks by the proposed method. The liquid dopant was also drawn on a Si substrate and driven in successfully. The proposed method makes it possible to form multi layer structures so that the method can combine various materials and may cover process of the conventional micromachining at the rather large scale.