DocumentCode
2578044
Title
The surface adhesion parameter: a measure for wafer bondability
Author
Gui, C. ; Elwenspoek, M. ; Tas, N. ; Gardeniers, J.G.E.
Author_Institution
MESA Res. Inst., Twente Univ., Enschede, Netherlands
fYear
1999
fDate
21-21 Jan. 1999
Firstpage
290
Lastpage
295
Abstract
A theory is presented which describes the initial direct wafer bonding process. The effect of surface microroughness on the bondability is studied on the basis of the theory of contact and adhesion of elastic solids. An effective bonding energy, the maximum of which is the specific surface energy of adhesion, is proposed to describe the real binding energy of the bonding interface including the influence of the wafer surface microroughness. Both the effective bonding energy and the real area of contact between rough surfaces depend on a dimensionless surface adhesion parameter, /spl theta/. Using the adhesion parameter as a measure, three kinds of wafer contact interfaces can be identified with respect to their bondability; viz. the non-bonding regime (/spl theta/>/spl ap/12), the bonding regime (/spl theta/\n\n\t\t
Keywords
adhesion; mechanical contact; micromachining; rough surfaces; semiconductor process modelling; surface energy; surface topography; wafer bonding; DMT-Maugis theory; adherence regime; bonding regime; contact mechanics theory; continuous model; dimensionless parameter; effective bonding energy; elastic solids contact; initial direct wafer bonding process; micromachining; nonbonding regime; real binding energy; specific surface energy of adhesion; statistical surface roughness model; surface adhesion parameter; surface microroughness; wafer bondability; wafer contact interfaces; Adhesives; Atmospheric modeling; Rough surfaces; Semiconductor device modeling; Solids; Surface roughness; Surface topography; Surface waves; Temperature; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
Conference_Location
Orlando, FL, USA
ISSN
1084-6999
Print_ISBN
0-7803-5194-0
Type
conf
DOI
10.1109/MEMSYS.1999.746839
Filename
746839
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