DocumentCode
2578254
Title
Fabrication and properties of 3-D polysilicon photonic lattices in the infrared
Author
Fleming, J.G. ; Lin, S.-Y.
Author_Institution
Sandia Nat. Labs., Albuquerque, NM, USA
fYear
1999
fDate
21-21 Jan. 1999
Firstpage
366
Lastpage
370
Abstract
Three-dimensional photonic lattices have been fabricated in the infrared using a variety of advanced silicon processes. The structures display band gaps centered at 12 /spl mu/ and 1.55 /spl mu/.
Keywords
elemental semiconductors; infrared spectra; optical fabrication; photonic band gap; silicon; 1.55 to 12 micron; Si; band gap; fabrication; infrared properties; three-dimensional polysilicon photonic lattice; Fabrication; Lattices; Lighting control; Micromechanical devices; Optical control; Optical devices; Photonic band gap; Photonic crystals; Photonic integrated circuits; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 1999. MEMS '99. Twelfth IEEE International Conference on
Conference_Location
Orlando, FL, USA
ISSN
1084-6999
Print_ISBN
0-7803-5194-0
Type
conf
DOI
10.1109/MEMSYS.1999.746856
Filename
746856
Link To Document