Title :
Evaluation of mask soaking performance in the thermal stabilized vacuum chamber in an EB mask writer
Author :
Mitsui, S. ; Akeno, K. ; Ogasawara, M. ; Tojo, T.
Author_Institution :
ASET EUV Kawasaki Branch Lab., Japan
Abstract :
In this paper, a new thermally stabilized vacuum chamber with improved soaking efficiency is constructed and its performance is evaluated.
Keywords :
electron beam lithography; masks; vacuum apparatus; EB mask writer; mask soaking; thermal stabilized vacuum chamber; Electrical resistance measurement; Rapid thermal processing; Robust control; Temperature control; Temperature measurement; Thermal factors; Thermal loading; Thermal management; Thermal resistance; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268597
