• DocumentCode
    2578660
  • Title

    Calculation of Coulomb interaction among electrons in a high current electron beam exposure system

  • Author

    Yukumoto, T. ; Kotera, M.

  • Author_Institution
    Dept. of Electron. Inf. & Commun. Eng., Osaka Inst. of Technol., Omiya, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    112
  • Lastpage
    113
  • Abstract
    In this paper, we propose a new approach to consider the Coulomb effect by separating the global and the stochastic mechanisms, and then, they are combined in a Monte Carlo electron trajectory simulation.
  • Keywords
    Monte Carlo methods; electron beam lithography; stochastic processes; Coulomb effect; Coulomb electron interaction; Monte Carlo electron trajectory simulation; high current electron beam exposure system; stochastic mechanisms; Electron beams; Electron optics; Equations; Large scale integration; Lithography; Monte Carlo methods; Optical beams; Solid modeling; Stochastic processes; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268601
  • Filename
    1268601
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2578660