Title :
Calculation of Coulomb interaction among electrons in a high current electron beam exposure system
Author :
Yukumoto, T. ; Kotera, M.
Author_Institution :
Dept. of Electron. Inf. & Commun. Eng., Osaka Inst. of Technol., Omiya, Japan
Abstract :
In this paper, we propose a new approach to consider the Coulomb effect by separating the global and the stochastic mechanisms, and then, they are combined in a Monte Carlo electron trajectory simulation.
Keywords :
Monte Carlo methods; electron beam lithography; stochastic processes; Coulomb effect; Coulomb electron interaction; Monte Carlo electron trajectory simulation; high current electron beam exposure system; stochastic mechanisms; Electron beams; Electron optics; Equations; Large scale integration; Lithography; Monte Carlo methods; Optical beams; Solid modeling; Stochastic processes; Throughput;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268601
