DocumentCode :
2578684
Title :
The 300mm Technology Current Status And Future Prospect
Author :
Komiya, H.
Author_Institution :
Semiconductor Leading Edge Technologies, Inc. 292 Yoshida+ho, Totsuka-ku, Yokohama-shi, Japan
fYear :
1997
fDate :
10-12 June 1997
Firstpage :
1
Lastpage :
3
Abstract :
Development of the 300¿ technology is approaching the exciting part of the program. The transition in the wafer diameter fiom 200¿ to 300¿ is expected to result in the chip cost reduction by the range of 1.520% and to decrease the investment in the production line down to about 65%. The technological key issues would be the crystal growth and the heat treatment. World-wide cooperative efforts are being made for the evaluation of the equipment and materials and for the standardiition.
Keywords :
Semiconductor devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
Type :
conf
DOI :
10.1109/VLSIT.1997.623667
Filename :
623667
Link To Document :
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