DocumentCode :
2578762
Title :
Body-raised double-gate structure for 1T DRAM
Author :
Kim, Garam ; Sang Wan Kim ; Song, Jae Young ; Jong Pil Kim ; Ryoo, Kyung-Chang ; Oh, Jeong-Hoon ; Park, Jae Hyun ; Hyun Woo Kim ; Park, Byung-Gook
Author_Institution :
Sch. of Electr. Eng., Seoul Nat. Univ., Seoul, South Korea
fYear :
2009
fDate :
2-5 June 2009
Firstpage :
259
Lastpage :
263
Abstract :
Higher sensing margin and longer retention time are critical issues for commercializing 1T DRAM. In this paper, we propose a body-raised double-gate structure to improve sensing margin and retention time of 1T DRAM and confirm the improvements through 3D simulation. This structure shows about 20% higher sensing margin than the planar structure. We have achieved longer retention time by using high doped raised body and lowering the magnitude of gate bias at hold state.
Keywords :
DRAM chips; field effect transistors; silicon-on-insulator; 1T DRAM; SOI; Z-RAM; body-raised double-gate structure; gate bias; high doped raised body; hold state; retention time; sensing margin; Capacitance; Capacitors; Cities and towns; Commercialization; Doping; Impact ionization; Nanotechnology; Random access memory; Semiconductor materials; USA Councils; 1T DRAM; Raised body; SOI; Z-RAM;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology Materials and Devices Conference, 2009. NMDC '09. IEEE
Conference_Location :
Traverse City, MI
Print_ISBN :
978-1-4244-4695-7
Electronic_ISBN :
978-1-4244-4696-4
Type :
conf
DOI :
10.1109/NMDC.2009.5167556
Filename :
5167556
Link To Document :
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