DocumentCode
2578818
Title
High beam current microcolumns with large apertures
Author
Park, S.S. ; Kim, D.W. ; Ahn, S.J. ; Kim, Y.C. ; Choi, S.K. ; Kim, D.Y. ; Kim, H.S.
Author_Institution
Dept. of Adv. Mater. & Phys., Sunmoon Univ., Asan, South Korea
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
126
Lastpage
127
Abstract
Advanced microcolumn results for lithography application including column designs for a high beam current, improved lens fabrication, and specimen current images are presented.
Keywords
elemental semiconductors; microlenses; photolithography; silicon; sputter etching; 200 eV to 1 keV; Si; high beam current microcolumns; lens fabrication; lithography; specimen current images; sputter etching; Apertures; Biomembranes; Etching; Fabrication; Lenses; Lithography; Probes; Semiconductor materials; Throughput; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268608
Filename
1268608
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