• DocumentCode
    2578874
  • Title

    Fabrication of GI structure using nanoimprint

  • Author

    Fujimoto, A. ; Asakawa, K.

  • Author_Institution
    Corp. Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    134
  • Lastpage
    135
  • Abstract
    Fabrication of Graded-Index (GI) structure using nanoimprint was investigated. The reflectivity was measured in order to investigate the refractive prevention of GI structure.
  • Keywords
    nanolithography; nanotechnology; reflectivity; silicon compounds; SiO/sub 2/; graded index structure; nanoimprint; reflectivity; Electron beams; Etching; Fabrication; Glass; Nanostructures; Reflectivity; Scanning electron microscopy; Self-assembly; Substrates; Surface waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268612
  • Filename
    1268612
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2578874