Title :
Evaporated electron beam lithography resist for non-planar surfaces
Author :
Lavallee, E. ; Beauvais, J. ; Drouin, D. ; Kelkar, Prasanna ; Yang, P. ; Turcotte, D. ; Cloutier, M. ; Legario, R.
Author_Institution :
Electr. Eng., Quantiscript Inc., Sherbrooke, Que., Canada
Abstract :
In this paper, the resist is evaporated using conventional thermal evaporation. Thickness as small as 20 nm have been demonstrated, with surface roughness as small as 4 nm rms.
Keywords :
electron beam lithography; evaporation; nanolithography; resists; surface roughness; 20 nm; conventional thermal evaporation; electron beam lithography; nonplanar surfaces; resist; surface roughness; Chromium; Electron beams; Fresnel reflection; Lenses; Lithography; Optical fibers; Resists; Rough surfaces; Solvents; Surface roughness;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268621
