DocumentCode :
2579031
Title :
65 nm device manufacture using shaped E-Beam lithography
Author :
Pain, L. ; Charpin, M. ; Laplanche, Y. ; Todeschini, J. ; Leininger, H. ; Tourniol, S. ; Faure, R. ; Bossy, X. ; Palla, R. ; Beverina, A. ; Broekaart, M. ; Judong, F. ; Brosselin, K. ; Le Friec, Y. ; Leverd, F. ; De Jonghe, V. ; Josse, E. ; Hinsinger, O.
Author_Institution :
CEA-LETI, Grenoble, France
fYear :
2003
fDate :
29-31 Oct. 2003
Firstpage :
158
Lastpage :
159
Abstract :
In this paper, SRAM cell device manufacture using shaped electron beam lithography was developed. TEM view of SRAM cell was showed.
Keywords :
SRAM chips; electron beam lithography; integrated circuit manufacture; semiconductor device manufacture; transmission electron microscopy; 65 nm; SRAM cell device manufacture; TEM; shaped electron beam lithography; Costs; Electron optics; Lithography; Manufacturing; Optical attenuators; Pain; Production; Prototypes; Research and development; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
Type :
conf
DOI :
10.1109/IMNC.2003.1268624
Filename :
1268624
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2579031
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