• DocumentCode
    2579068
  • Title

    5-nm-order electron-beam lithography for nanodevice fabrication

  • Author

    Yamazaki, K. ; Namatsu, H.

  • Author_Institution
    NTT Basic Res. Lab., NTT Corp., Kanagawa, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    162
  • Lastpage
    163
  • Abstract
    In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.
  • Keywords
    electron resists; nanotechnology; organic compounds; scanning electron microscopy; 30 nm; 5 nm; HSQ resist; SEM; electron-beam lithography; nanodevice fabrication; Electron optics; Electrooptic deflectors; Fabrication; Hydrogen; Laboratories; Lithography; Nanolithography; Nanotechnology; Resists; Scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268626
  • Filename
    1268626
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2579068