DocumentCode
2579312
Title
High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation
Author
Matsumoto, T. ; Mimura, H.
Author_Institution
Res. & Dev. Center, Stanley Electr. Co., Yokohama, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
192
Abstract
Summary form only given. High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation were investigated. We introduce a new nanometer-sized tailored cathode that can be made by simple etching of nano-craters onto a graphite substrate.
Keywords
X-ray production; cathodes; electron field emission; graphite; nanostructured materials; radiography; sputter etching; C; graphite nanostructure; high density electron emission; high intensity pulse X-ray generation; hydrogen plasma etching; nanocraters etching; nanometer-sized tailored cathode; Cathodes; Electron emission; Electronic mail; Plasma applications; Plasma density; Plasma x-ray sources; Pulse generation; X-ray imaging;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268640
Filename
1268640
Link To Document