Ultra-thin Silicon Nitride Gate Dielectric For Deep-sub-micron CMOS Devices

Author

Khare, M. ; Xin Guo ; Wang, X.W. ; Ma, T.P. ; Cui, G.J. ; Tamagawa, T. ; Halpern, B.L. ; Schmitt, J.J.

Author_Institution

Dept. of Electrical Engineering, Yale University, New Haven, CT 06520

fYear

1997

fDate

10-12 June 1997

Firstpage

Lastpage

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

Print_ISBN

4-930813-75-1

Type

DOI

10.1109/VLSIT.1997.623690

Filename

623690

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