Title :
Patterning of self-assembled nanoparticles by electron-beam lithography with chemically amplified resists
Author :
Kuo, C.I. ; Chen, H.L. ; Chu, Y.H. ; Liu, F.K. ; Ko, F.H. ; Chu, T.C.
Author_Institution :
Nat. Nano Device Lab., Hsinchu, Taiwan
Abstract :
In this paper, patterning of self-assembled nanoparticles by using a shaped electron-beam exposure system with commercial chemically amplified resists (CAR) was demonstrated.
Keywords :
electron beam lithography; gold; nanolithography; nanoparticles; particle size; self-assembly; Au; chemically amplified resists; electron-beam exposure system; electron-beam lithography; particle size; self assembled nanoparticles patterning; Biological materials; Chemicals; Electron beams; Gold; Lithography; Magnetic materials; Nanoparticles; Optical materials; Resists; Self-assembly;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268724
