Development of vacuum environment compatible nano-probe system

In VLSI manufacturing, increase in the level of integration and functional improvement are essential. In order to achieve these objectives, semiconductor manufacturers are beginning to establish sub-0.1 /spl mu/m micro fabrication technologies. On the other hand, it is also necessary to compose the electrodes for operation tests of the VLSI. However, the size of electrodes available for such applications are currently on the order of 50*50 - 100* 100 /spl mu/m, which is a serious problem which must be overcome to accomplish the above-mentioned improvements in VLSI manufacturing. We have developed a new probe of which the tip diameter is 1 /spl mu/m or less. Also, we have succeeded in developing a new system that incorporates four sets of manipulators, which can accommodate the new probe and direct it to a desired location by observation with high resolution using a SEM (Scanning Electron Microscope).