Title :
Incident angle dependence of O/sub 2/ cluster ions on Ta/sub 2/O/sub 5/ thin film properties
Author :
Inoue, S. ; Fujiwara, Y. ; Toyoda, N. ; Yamada, I. ; Tsubakino, H.
Author_Institution :
Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
Abstract :
In this paper, the incident angle dependence of assisting O/sub 2/ cluster ion beams for various film properties was reported. Surface roughness and AFM image of Ta/sub 2/O/sub 5/ films was shown.
Keywords :
atomic force microscopy; dielectric thin films; ion beam effects; surface morphology; surface roughness; tantalum compounds; 200 nm; AFM image; O/sub 2/ cluster ions; Ta/sub 2/O/sub 5/; Ta/sub 2/O/sub 5/ thin film properties; incident angle; surface roughness; Atomic layer deposition; Ion beams; Optical films; Optical microscopy; Optical surface waves; Rough surfaces; Sputtering; Surface morphology; Surface roughness; Transistors;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268749
