Studies on the mechanism of high resolution and high aspect ratio in DFVP

Summary form only given. Development-free vapor photolithography (DFVP) is a unique all-dry pattern transfer technique with many advantages such as superior quality, high aspect ratio and high resolution. This paper analyzes the mechanism of the DFVP and proposes a theory model to explain the cause of its advantages. In this paper we study the effects of several polymers upon the development free vapor photolithography. Research shows that functional groups of polymers, glass transition temperature (Tg), film thickness, and etching temperature all have effects on the reaction. Experiments are designed and carried out, the result shows the polymer is the main factor affecting the resolution and aspect ratio of the pattern.