• DocumentCode
    2581088
  • Title

    Spatial profile of neutral free radical beam produced by the method of phot-deionization of negative ion beams

  • Author

    Konno, Hlroshl ; Oseki, Takashi ; Kanayama, Takuo ; Hayashi, Keljl

  • Author_Institution
    Adv. Mater. Sci. R&D Center, Kanazawa Inst. of Technol., Ishikawa, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    272
  • Lastpage
    273
  • Abstract
    We have been developing a trial surface processing apparatus utilizing a steady-flux refined beam of neutral free radicals (RBNR) produced by the PDINIB (photo-deionization of negative ion beams) method. We could improve the S/N ratio and the spatial resolution of the DNIC (decreasing negative ion beam current) measurement system 40 times and 7 times, respectively. This improved monitoring system is used for measurement of the spatial profile of the neutral-beam flux under various conditions of the neutral-beam productions.
  • Keywords
    beam handling techniques; free radicals; ion beams; photoionisation; S/N ratio; monitoring system; negative ion beam current; neutral free radical beam production; neutral-beam flux; photo-deionization; spatial profile; Ion beams; Laser beams; Materials science and technology; Optical pulses; Particle beams; Plasma chemistry; Plasma simulation; Power lasers; Production; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268751
  • Filename
    1268751