DocumentCode :
2581088
Title :
Spatial profile of neutral free radical beam produced by the method of phot-deionization of negative ion beams
Author :
Konno, Hlroshl ; Oseki, Takashi ; Kanayama, Takuo ; Hayashi, Keljl
Author_Institution :
Adv. Mater. Sci. R&D Center, Kanazawa Inst. of Technol., Ishikawa, Japan
fYear :
2003
fDate :
29-31 Oct. 2003
Firstpage :
272
Lastpage :
273
Abstract :
We have been developing a trial surface processing apparatus utilizing a steady-flux refined beam of neutral free radicals (RBNR) produced by the PDINIB (photo-deionization of negative ion beams) method. We could improve the S/N ratio and the spatial resolution of the DNIC (decreasing negative ion beam current) measurement system 40 times and 7 times, respectively. This improved monitoring system is used for measurement of the spatial profile of the neutral-beam flux under various conditions of the neutral-beam productions.
Keywords :
beam handling techniques; free radicals; ion beams; photoionisation; S/N ratio; monitoring system; negative ion beam current; neutral free radical beam production; neutral-beam flux; photo-deionization; spatial profile; Ion beams; Laser beams; Materials science and technology; Optical pulses; Particle beams; Plasma chemistry; Plasma simulation; Power lasers; Production; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
Type :
conf
DOI :
10.1109/IMNC.2003.1268751
Filename :
1268751
Link To Document :
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