Title :
Resist outgassing characteristics in EUVL
Author :
Watanabe, T. ; Hamamoto, K. ; Kinoshita, H. ; Hada, H. ; Komano, H.
Author_Institution :
Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
Abstract :
In this article explain the importance of outgassing and its characteristics in EUVL. Here discuss the decomposition reaction of the resist in EUV irradiation.
Keywords :
decomposition; dissociation; outgassing; resists; ultraviolet lithography; ultraviolet radiation effects; EUV irradiation; decomposition; extreme ultraviolet lithography; resist outgassing characteristics; Chemicals; Hydrocarbons; Laboratories; Lithography; Materials science and technology; Mirrors; Protection; Resists; Solvents; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268759
