Title :
Double gratings lateral shearing interferometer for EUVL
Author :
Liu, Z.Q. ; Zhu, Y. ; Sugisaki, K. ; Ishii, M. ; Murakami, K. ; Saito, J. ; Suzuki, A. ; Hasegawa, M.
Author_Institution :
Wave Front Meas. Lab., Extreme Ultraviolet Lithography Syst. Dev. Assoc., Sagamihara, Japan
Abstract :
At wavelength measurement is important for EUVL PO (Extreme Ultraviolet Lithograph Project Optics). Because the wavelength of EUVL is very short, it is difficult to use normal interferometers for this. We suggest a DLSI (Double grating lateral shearing interferometer) in which the influence of the light source can be canceled. Moreover, in DLSI, the interferogram is one-color.
Keywords :
diffraction gratings; light interferometers; masks; ultraviolet lithography; double gratings lateral shearing interferometer; fringe scanning; one-color interferogram; ultraviolet lithography; Charge coupled devices; Diffraction; Gratings; Interferometric lithography; Large scale integration; Light sources; Optical interferometry; Shearing; Ultraviolet sources; Wavelength measurement;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268760
