DocumentCode
2581382
Title
Analyses of alignment measurement error
Author
Sugaya, A.
Author_Institution
Nikon Corp., Tokyo, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
310
Abstract
Summary form only given. In this article, the alignment patterns that are subject to have some large alignment measurement errors are discussed. Secondly, FFO (FIA focus optimization) is discussed. FFO is an optical alignment technique, which greatly improves the accuracy of FIA (Field Image Alignment) sensor of Nikon´s NSR series.
Keywords
ULSI; image sensors; lithography; measurement errors; Nikon NSR series; ULSI; alignment measurement error; alignment pattern; field image alignment sensor; focus optimization; lithography; Image processing; Image sensors; Lithography; Measurement errors; Optical devices; Optical imaging; Optical sensors; Sensor phenomena and characterization; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268770
Filename
1268770
Link To Document