Title :
Analyses of alignment measurement error
Author_Institution :
Nikon Corp., Tokyo, Japan
Abstract :
Summary form only given. In this article, the alignment patterns that are subject to have some large alignment measurement errors are discussed. Secondly, FFO (FIA focus optimization) is discussed. FFO is an optical alignment technique, which greatly improves the accuracy of FIA (Field Image Alignment) sensor of Nikon´s NSR series.
Keywords :
ULSI; image sensors; lithography; measurement errors; Nikon NSR series; ULSI; alignment measurement error; alignment pattern; field image alignment sensor; focus optimization; lithography; Image processing; Image sensors; Lithography; Measurement errors; Optical devices; Optical imaging; Optical sensors; Sensor phenomena and characterization; Ultra large scale integration;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268770
