• DocumentCode
    2581382
  • Title

    Analyses of alignment measurement error

  • Author

    Sugaya, A.

  • Author_Institution
    Nikon Corp., Tokyo, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    310
  • Abstract
    Summary form only given. In this article, the alignment patterns that are subject to have some large alignment measurement errors are discussed. Secondly, FFO (FIA focus optimization) is discussed. FFO is an optical alignment technique, which greatly improves the accuracy of FIA (Field Image Alignment) sensor of Nikon´s NSR series.
  • Keywords
    ULSI; image sensors; lithography; measurement errors; Nikon NSR series; ULSI; alignment measurement error; alignment pattern; field image alignment sensor; focus optimization; lithography; Image processing; Image sensors; Lithography; Measurement errors; Optical devices; Optical imaging; Optical sensors; Sensor phenomena and characterization; Ultra large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268770
  • Filename
    1268770