Title :
Laser plasma light source based on a gas puff target for EUV metrology applications
Author :
Fiedorowicz, H. ; Bartnik, A. ; Jarocki, R. ; Kostecki, J. ; Mikolajczyk, J. ; Rakowski, R. ; Szczurek, M.
Author_Institution :
Inst. of Optoelectron., Mil. Univ. of Technol., Warszawa, Poland
Abstract :
Summary form only given. In this paper a newly developed compact EUV source is presented. The source is based on the double-stream gas puff target. Using the double-stream gas puff target approach a compact low-power laser plasma light source for metrology of optics, masks and resists for EUV lithography technologies has been developed.
Keywords :
plasma sources; ultraviolet lithography; ultraviolet sources; EUV source metrology; double-stream gas puff target; extreme UV source; laser plasma light source; masks; optics; resists; ultraviolet lithography; Gas lasers; Gratings; Light sources; Metrology; Plasma applications; Plasma sources; Solid lasers; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268772
