• DocumentCode
    2581620
  • Title

    Fabrication of low line edge roughness mold for photo-nanoimprint

  • Author

    Kurashima, Y. ; Hiroshima, H. ; Komuro, M. ; Kim, S. ; Yamazaki, N. ; Taniguchi, J. ; Miyamoto, I. ; Namatsu, H. ; Matsui, S.

  • Author_Institution
    AIST, XXX, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    340
  • Lastpage
    341
  • Abstract
    In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.
  • Keywords
    elemental semiconductors; etching; nanolithography; photolithography; silicon; Si; Si master mold; anisotropic wet etching; low line edge roughness mold; photonanoimprint; Anisotropic magnetoresistance; Atomic force microscopy; Atomic measurements; Dry etching; Electron beams; Fabrication; Force measurement; Optical films; Scanning electron microscopy; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268785
  • Filename
    1268785
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2581620