• DocumentCode
    2582088
  • Title

    Advanced Gate-stack Architecture For Low-voltage Dual-workfunction CMOS Technologies With Shallow Trench Isolation

  • Author

    Schwalke, U. ; Kerber, M. ; Koller, K. ; Ludwig, B. ; Seidl, A.

  • Author_Institution
    Siemens, Corp. R&D, Microelectronics, 2) Siemens, Semiconductor Division 81739 Munich, Germany
  • fYear
    1997
  • fDate
    10-12 June 1997
  • Firstpage
    71
  • Lastpage
    72
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
  • Print_ISBN
    4-930813-75-1
  • Type

    conf

  • DOI
    10.1109/VLSIT.1997.623700
  • Filename
    623700
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2582088