Title :
Implication And Solutions For Joule Heating In High Performance Interconnects Incorporating Low-k Dielectrics
Author :
Shih, W.-Y. ; Chang, M.-C. ; Havemann, R.H. ; Levine, J.
Author_Institution :
Semiconductor Process and Device Center, MS 461, Texas Instruments, Dallas, TX 75243
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
DOI :
10.1109/VLSIT.1997.623706
