• DocumentCode
    2583179
  • Title

    Implication And Solutions For Joule Heating In High Performance Interconnects Incorporating Low-k Dielectrics

  • Author

    Shih, W.-Y. ; Chang, M.-C. ; Havemann, R.H. ; Levine, J.

  • Author_Institution
    Semiconductor Process and Device Center, MS 461, Texas Instruments, Dallas, TX 75243
  • fYear
    1997
  • fDate
    10-12 June 1997
  • Firstpage
    83
  • Lastpage
    84
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
  • Print_ISBN
    4-930813-75-1
  • Type

    conf

  • DOI
    10.1109/VLSIT.1997.623706
  • Filename
    623706
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2583179