2583811

Manufacturable Shallow-junction Processes To Overcome Defect Formation And Dopant Reactions For Sub-0.18/spl mu/m CMOS Technologies

Liu, C.T. ; Baumann, F.H. ; Vuong, H.H. ; Psi ; Eaglesham, D.J. ; Liu, R. ; Chang, C.P. ; Cheung, K.P. ; Colonell, J.I. ; Lai, W.Y.C. ; Hillenius, S.J.

Bell Laboratories, Lucent Technologies, 700 Mountain Ave., Murray Hill, NJ 07974

1997

10-12 June 1997

91

92

English

ieee

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

4-930813-75-1

conf

10.1109/VLSIT.1997.623710

623710