Manufacturable Shallow-junction Processes To Overcome Defect Formation And Dopant Reactions For Sub-0.18/spl mu/m CMOS Technologies

Author

Liu, C.T. ; Baumann, F.H. ; Vuong, H.H. ; Psi ; Eaglesham, D.J. ; Liu, R. ; Chang, C.P. ; Cheung, K.P. ; Colonell, J.I. ; Lai, W.Y.C. ; Hillenius, S.J.

Author_Institution

Bell Laboratories, Lucent Technologies, 700 Mountain Ave., Murray Hill, NJ 07974

fYear

1997

fDate

10-12 June 1997

Firstpage

Lastpage

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

Print_ISBN

4-930813-75-1

Type

DOI

10.1109/VLSIT.1997.623710

Filename

623710

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