Title :
A very simple trench isolation (VSTI) technology with chemo-mechanically polished (CMP) substrate Si
Author :
Park, T. ; Lee, H.S. ; Shin, Y.G. ; Hong, C.G. ; Kang, H.K. ; Koh, Y.B. ; Lee, M.Y.
Author_Institution :
Semiconductor R&D Center, Samsung Electronics Co., Ltd. San #24, Nongseo-Ree, Kiheung-Eup, Yongin-Si, Kyonggi-Do, 449-900, Korea
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
DOI :
10.1109/VLSIT.1997.623728
