DocumentCode :
2588520
Title :
Low-damage ECR-plasma-etching technique for SrBi/sub 2/Ta/sub 2/O/sub 9/ (SBT) capacitor for FeRAM devices
Author :
Maejima, Y. ; Saitoh, S. ; Hayashi, Y.
Author_Institution :
Microelectronics Research Laboratories, NEC Corporation 1120, Shimokuzawa, Sagamihara, Kanagawa 229, Japan
fYear :
1997
fDate :
10-12 June 1997
Firstpage :
137
Lastpage :
138
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
Type :
conf
DOI :
10.1109/VLSIT.1997.623736
Filename :
623736
Link To Document :
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