Title :
Charging And Intrinsic-leakage Current Peaks In Thin Silicon-dioxide Films
Author :
Yamada, R. ; Yugami, J. ; Ohkura, M.
Author_Institution :
Central Research Laboratory, Hitachi, Ltd. Kokubunji, Tokyo 185, Japan
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
DOI :
10.1109/VLSIT.1997.623741
