The Simplest Stacked BST Capacitor For The Future DRAMs Using A Novel Low Temperature Growth Enhanced Crystallization

Author

Takehiro, S. ; Yamauchi, S. ; Yoshimaru, M. ; Onoda, H.

Author_Institution

VLSI R&D Center, Oki Electric Industry Co., Ltd. Hachioji, Tokyo 193 Japan

fYear

1997

fDate

10-12 June 1997

Firstpage

153

Lastpage

154

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

Print_ISBN

4-930813-75-1

Type

DOI

10.1109/VLSIT.1997.623744

Filename

623744

Link To Document