DocumentCode :
2590348
Title :
High-overtone bulk acoustic wave resonator on galliumnitride
Author :
Loschonsky, Marc ; Eisele, David ; Masson, Jeremy ; Wieneke, Matthias ; Alzuaga, Sebastien ; Dadgar, Armin ; Ballandras, Sylvain ; Krost, Alois ; Reindl, Leonhard
Author_Institution :
IMTEK - Dept. of Microsyst. Eng., Albert-Ludwigs-Univ. Freiburg, Freiburg, Germany
fYear :
2009
fDate :
20-24 April 2009
Firstpage :
309
Lastpage :
315
Abstract :
In our previous research we already demonstrated micro acoustic devices, such as membrane based thin film bulk acoustic shear wave resonators and surface acoustic shear wave resonators, based on metal-organic-vapour-phase-epitaxial (MOVPE) grown highly oriented a-plane piezoelectric material. Although MOVPE is a well established process for compound semiconductor layer growth especially of III-V semiconductors as InP, GaAs, and the nitrides GaN or AlN as also design and simulation of micro acoustic devices is nowadays a well established knowledge, the linkage between both is quite a technological challenge. Using an adapted MOVPE growth process for a-plane GaN on r-plane sapphire with a process linked improved surface quality; the challenge to build up high-overtone bulk acoustic wave resonators (HBAR) with a shear polarization of the acoustic wave was risen within this research. Different designs of MEMS-based prototypes of HBARs were processed on a-plane GaN after intensive simulations, their acoustic electrical behaviour analyzed and the temperature coefficient of frequency determined.
Keywords :
III-V semiconductors; MOCVD; gallium arsenide; gallium compounds; indium compounds; micromechanical devices; piezoelectric materials; sapphire; surface acoustic wave resonators; thin films; vapour phase epitaxial growth; wide band gap semiconductors; AlN; GaAs; GaN; III-V semiconductors; InP; MEMS based prototypes; MOVPE growth; gallium nitride; high-overtone bulk acoustic wave resonators; metal-organic-vapour-phase-epitaxial growth; piezoelectric material; sapphire; surface acoustic shear wave resonators; thin film; Acoustic devices; Acoustic waves; Biomembranes; Epitaxial growth; Epitaxial layers; Gallium nitride; III-V semiconductor materials; Piezoelectric films; Surface acoustic wave devices; Surface acoustic waves;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium, 2009 Joint with the 22nd European Frequency and Time forum. IEEE International
Conference_Location :
Besancon
ISSN :
1075-6787
Print_ISBN :
978-1-4244-3511-1
Electronic_ISBN :
1075-6787
Type :
conf
DOI :
10.1109/FREQ.2009.5168192
Filename :
5168192
Link To Document :
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