Numerical Simulation of Ellipsometry Measurement in Millimeter-Wave Band

Author

Xianwang, Yang ; Minning, Ji ; Mingxiang, Li

Author_Institution

Sch. of Commun. & Inf. Eng., Shanghai Univ., Shanghai

fYear

2008

fDate

10-12 Sept. 2008

Firstpage

723

Lastpage

726

Abstract

A new ellipsometry method for measuring the permittivity and thickness of dielectric materials at millimeter wavelength is presented in this paper. The relationship between ellipsometric parameters and dielectric material parameters is investigated by numerical simulation. The results show that different permittivities and different thicknesses may correspond to same ellipsometric parameters. However, for most dielectric films which are widely used, the permittivity and thickness can be determined uniquely.

Keywords

dielectric materials; dielectric thin films; millimetre wave measurement; permittivity measurement; thickness measurement; dielectric films; dielectric material thickness; ellipsometry measurement; millimeter-wave band measurement; permittivity measurement; Dielectric films; Dielectric materials; Dielectric measurements; Ellipsometry; Millimeter wave measurements; Millimeter wave technology; Numerical simulation; Permittivity measurement; Thickness measurement; Wavelength measurement; ellipsometry; millimeter wave; numerical simulation; permittivity;

fLanguage

English

Publisher

ieee

Conference_Titel

Microwave Conference, 2008 China-Japan Joint

Conference_Location

Shanghai

Print_ISBN

978-1-4244-3821-1

Type

conf

DOI

10.1109/CJMW.2008.4772530

Filename

4772530