Diagnostic expert system application to problem solving in a semiconductor manufacturing facility

Author

Weatherwax, Caroline M. ; Tsareff, Christopher R.

Author_Institution

Hughes Aircraft Co., Carlsbad, CA, USA

fYear

1990

fDate

11-12 Sep 1990

Firstpage

37

Lastpage

41

Abstract

The development and construction of the expert system, the acquisition and representation of knowledge, and an implementation of the system are discussed. In this implementation, systems covering the photolithography and ion implantation areas were used for full-time production use by manufacturing personnel. Implementation and acceptance issues are addressed. Operators can use the expert systems to solve many routine processing problems that were once the exclusive domain of sustaining engineers. Improvements in the areas of productivity, quality, and downtime were demonstrated

Keywords

electronic engineering computing; expert systems; integrated circuit manufacture; ion implantation; photolithography; semiconductor device manufacture; expert system; full-time production; ion implantation; knowledge acquisition; knowledge-representation; photolithography; semiconductor manufacturing facility; Decision trees; Diagnostic expert systems; Expert systems; Fabrication; Knowledge acquisition; Knowledge engineering; Knowledge representation; Manufacturing processes; Problem-solving; Semiconductor device manufacture;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990

Conference_Location

Danvers, MA

Type

conf

DOI

10.1109/ASMC.1990.111218

Filename

111218