DocumentCode :
2591723
Title :
Fast turn around post process yield enhancement for custom VLSI foundries
Author :
Parks, H.G.
Author_Institution :
Dept. of Electr. & Comput. Eng., Arizona Univ., Tucson, AZ, USA
fYear :
1990
fDate :
11-12 Sep 1990
Firstpage :
82
Lastpage :
87
Abstract :
An effective fast-turnaround postprocess yield-enhancement methodology for custom VLSI which has been developed using a static random access memory (SRAM) and a test element group (TEG) yield vehicle is described. The SRAM/TEG is combined on a single chip providing a unified process-control vehicle. Several examples of visual defect classification using SRAM failure analysis and nonvisual defect characterization from the electrical test monitors are presented. Application of the methodology to yield enhancement efforts for a 1.25-μm process is presented showing excellent correlation of SRAM and custom circuit yields with a 100× defect density reduction over a two-year period
Keywords :
SRAM chips; VLSI; failure analysis; integrated circuit manufacture; integrated circuit testing; SRAM failure analysis; correlation; custom VLSI foundries; custom circuit yields; fast-turnaround; nonvisual defect characterization; post process yield enhancement; process-control vehicle; static random access memory; test element group; Foundries; Inspection; Integrated circuit yield; Process control; Random access memory; SRAM chips; Scanning electron microscopy; Testing; Vehicles; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990
Conference_Location :
Danvers, MA
Type :
conf
DOI :
10.1109/ASMC.1990.111225
Filename :
111225
Link To Document :
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