Title :
An access-transistor-free (0T/1R) non-volatile resistance random access memory (RRAM) using a novel threshold switching, self-rectifying chalcogenide device
Author :
Yi-Chou Chen ; Chen, C.F. ; Chen, C.T. ; Yu, J.Y. ; Wu, S. ; Lung, S.L. ; Liu, R. ; Chih-Yuan Lu
Author_Institution :
Macronix Int. Co., Ltd., Hsin-Chu, Taiwan
Abstract :
A new concept for non-volatile memory is demonstrated. This new technique controls the threshold voltage of the chalcogenide storage device by varying the height and duration of the write pulse. Consequently, the chalcogenide device serves as both the access element and the memory element. Therefore, it does not need any access transistor in the memory array. The new memory achieves the requirement of non-volatility, fast writing/reading, random access, high scalability, compact cell size, and low cost.
Keywords :
germanium compounds; random-access storage; RRAM; TiW-Ge/sub 2/Sb/sub 2/Te/sub 5/-W; access element; access-transistor-free RAM; fast writing/reading speed; memory element; nonvolatile memory; nonvolatile resistance random access memory; self-rectifying chalcogenide device; threshold switching device; Amorphous materials; Costs; Crystalline materials; Crystallization; Electrodes; Nonvolatile memory; Phase change materials; Random access memory; Space vector pulse width modulation; Threshold voltage;
Conference_Titel :
Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-7872-5
DOI :
10.1109/IEDM.2003.1269425