DocumentCode
2591864
Title
A comprehensive CAM environment for fast-turn IC prototyping
Author
Barnum, C.B. ; Cunningham, D.J.
Author_Institution
Massachusetts Microelectron. Center, Westborough, MA, USA
fYear
1990
fDate
11-12 Sep 1990
Firstpage
104
Lastpage
107
Abstract
A prototype integrated-circuit (IC) computer-aided-manufacturing (CAM) environment to support university education and research programs is described. The CAM system, mask making, and wafer fabrication are discussed. Process controls and the assembly process are described
Keywords
CAD/CAM; education; integrated circuit manufacture; masks; process computer control; CAM environment; assembly process; computer-aided-manufacturing; fast-turn IC prototyping; mask making; process control; university education; university research; wafer fabrication; Assembly; CADCAM; Computer aided manufacturing; Educational institutions; Fabrication; Microelectronics; Production facilities; Prototypes; Very large scale integration; Voice mail;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990
Conference_Location
Danvers, MA
Type
conf
DOI
10.1109/ASMC.1990.111230
Filename
111230
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