Title :
A 174 W high-efficiency GaN HEMT power amplifier for W-CDMA base station applications
Author :
Joshin, K. ; Kikkawa, T. ; Hayashi, H. ; Maniwa, Toru ; Yokokawa, S. ; Yokoyama, M. ; Adachi, N. ; Takikawa, M.
Author_Institution :
Fujitsu Labs. Ltd., Atsugi, Japan
Abstract :
AlGaN/GaN high electron mobility transistors (HEMTs) have been developed for current-collapse-free operation at high drain bias voltages. The newly designed single-chip GaN HEMT amplifier for W-CDMA base station applications achieves a record CW output power of 150 W with a high power-added efficiency (PAE) of 54% at 2.1 GHz. The amplifier, combined with a digital pre-distortion (DPD) system, also demonstrates a state of the art efficiency of 40% with an adjacent channel leakage power ratio (ACLR) of less than -50 dBc for 4-carrier W-CDMA signals and reaches the saturated peak power level of 174 W with a drain supply voltage of 63 V. We prove for the first time that the AlGaN/GaN HEMT amplifier can completely fulfills the W-CDMA system requirement.
Keywords :
HEMT integrated circuits; III-V semiconductors; UHF integrated circuits; UHF power amplifiers; code division multiple access; gallium compounds; wide band gap semiconductors; 174 W; 2.1 GHz; GaN; HEMT power amplifier; W-CDMA base station; adjacent channel leakage power ratio; digital predistortion system; high power-added efficiency; high-efficiency amplifier; single-chip amplifier; Aluminum gallium nitride; Base stations; Gallium nitride; HEMTs; High power amplifiers; MODFETs; Multiaccess communication; Power amplifiers; Power generation; Voltage;
Conference_Titel :
Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-7872-5
DOI :
10.1109/IEDM.2003.1269444