Title :
Path Delay Tuning for Performance Gain in the Face of Random Manufacturing Variations
Author :
Mishra, K. ; Faraz, A. ; Singh, Adit D. ; Chatterjee, Avhishek
Author_Institution :
Auburn Univ., Auburn, AL, USA
Abstract :
One of the factors now beginning to seriously limit clock rates in large synchronous designs is manufacturing variations in device parameters. Moreover, such random process variations are increasing significantly with device scaling as technology approaches the end of the silicon roadmap. In a large design containing several millions of transistors, virtually every manufactured part will have a few hundreds of transistors that are significant performance outliers. Any one such device in a critical path can greatly limit the highest clock rate that can be achieved by the chip. In this paper we propose and analyze a new design approach that allows for the post manufacture tuning and speed-up of exceptionally slow circuit paths to recover much of the performance lost due to such outlier devices. We show that such tuning of exceptionally slow paths can result in a significant increase in the average clock speed attainable by the manufactured parts. We also show this method to be defect tolerant, implying an additional benefit of increasing the semiconductor yield.
Keywords :
circuit tuning; clocks; integrated circuit manufacture; integrated circuit yield; clock rates; device parameters; device scaling; path delay tuning; post manufacture tuning; semiconductor yield; synchronous designs; transistors; Clocks; Delay; Integrated circuit modeling; Logic gates; Performance evaluation; Transistors; Tuning; Performance; clock rate; delay; path; speed-up; tuning;
Conference_Titel :
VLSI Design (VLSI Design), 2011 24th International Conference on
Conference_Location :
Chennai
Print_ISBN :
978-1-61284-327-8
Electronic_ISBN :
1063-9667
DOI :
10.1109/VLSID.2011.35