2596784

Massively Parallel Algorithms for Scattering in Optical Lithography

Guerrieri, Roberto ; Gamelin, J. ; Tadros, K. ; Neureuther, A.

University of California, Berkeley

1990

3-4 Jun 1990

1

2

Bleaching; Boundary conditions; Concurrent computing; Electromagnetic scattering; Equations; Lithography; Optical scattering; Parallel algorithms; Resists; Time domain analysis;

English

ieee

Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on

conf

10.1109/NUPAD.1990.748247

748247