DocumentCode
2596784
Title
Massively Parallel Algorithms for Scattering in Optical Lithography
Author
Guerrieri, Roberto ; Gamelin, J. ; Tadros, K. ; Neureuther, A.
Author_Institution
University of California, Berkeley
fYear
1990
fDate
3-4 Jun 1990
Firstpage
1
Lastpage
2
Keywords
Bleaching; Boundary conditions; Concurrent computing; Electromagnetic scattering; Equations; Lithography; Optical scattering; Parallel algorithms; Resists; Time domain analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
Type
conf
DOI
10.1109/NUPAD.1990.748247
Filename
748247
Link To Document