• DocumentCode
    2596784
  • Title

    Massively Parallel Algorithms for Scattering in Optical Lithography

  • Author

    Guerrieri, Roberto ; Gamelin, J. ; Tadros, K. ; Neureuther, A.

  • Author_Institution
    University of California, Berkeley
  • fYear
    1990
  • fDate
    3-4 Jun 1990
  • Firstpage
    1
  • Lastpage
    2
  • Keywords
    Bleaching; Boundary conditions; Concurrent computing; Electromagnetic scattering; Equations; Lithography; Optical scattering; Parallel algorithms; Resists; Time domain analysis;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
  • Type

    conf

  • DOI
    10.1109/NUPAD.1990.748247
  • Filename
    748247