• DocumentCode
    2596905
  • Title

    Vapor-assisted hybrid bonding of inorganic/organic substrates for 3D hetero integration

  • Author

    Shigetou, A. ; Suga, T.

  • Author_Institution
    Nat. Inst. for Mater. Sci. (NIMS), Tsukuba, Japan
  • fYear
    2012
  • fDate
    22-23 May 2012
  • Firstpage
    59
  • Lastpage
    59
  • Abstract
    Hybrid bonding of metal electrodes, semiconductor substrates, glass substrates, and polymeric materials by using a single vapor-assisted surface activation method at 150 °C and atmospheric pressure is highly feasible. The details of process optimization and some bond examples are stated in this report.
  • Keywords
    copper; electrodes; glass; integrated circuit bonding; optimisation; polymers; semiconductor materials; three-dimensional integrated circuits; 3D hetero-integration; Cu; atmospheric pressure; glass substrate; inorganic-organic substrate; metal electrode; polymeric material; process optimization; semiconductor substrate; single vapor-assisted surface activation method; vapor-assisted hybrid bonding; Bonding; Polyimides; Substrates; Surface cleaning;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Low Temperature Bonding for 3D Integration (LTB-3D), 2012 3rd IEEE International Workshop on
  • Conference_Location
    Tokyo
  • Print_ISBN
    978-1-4673-0743-7
  • Type

    conf

  • DOI
    10.1109/LTB-3D.2012.6238048
  • Filename
    6238048