DocumentCode
2597012
Title
The study on the micro-voids of InP/Si and InP/SiO2 wafer bonding by infrared transmission and scanning acoustic microscopy
Author
Zhang, Xuan Xiong ; Ou, Yi ; Yang, Fan ; Ye, Tian Chun ; Zhuang, Song Lin
fYear
2012
fDate
22-23 May 2012
Firstpage
85
Lastpage
85
Abstract
Low temperature wafer bonding for InP/Si and InP/SiO2 was studied. Scanning acoustic microscopy (SAM) has to be used for characterizing the bonding interface to determine if there are micro-voids (<;1 μm) at the interface although infrared imaging is available to InP/Si and InP/SiO2 bonding. The micro-voids also appear in the wafer bonding with oxide.
Keywords
III-V semiconductors; acoustic microscopy; elemental semiconductors; indium compounds; silicon; silicon compounds; voids (solid); wafer bonding; InP-Si; InP-SiO2; bonding interface; infrared imaging; infrared scanning acoustic microscopy; infrared transmission acoustic microscopy; low temperature wafer bonding; microvoid; Acoustics; Annealing; Bonding; Indium phosphide; Microscopy; Silicon; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Low Temperature Bonding for 3D Integration (LTB-3D), 2012 3rd IEEE International Workshop on
Conference_Location
Tokyo
Print_ISBN
978-1-4673-0743-7
Type
conf
DOI
10.1109/LTB-3D.2012.6238054
Filename
6238054
Link To Document