Title :
Adaptive Mesh Refinement For Multilayer Process Simulation
Author :
Baccus, Bruno ; Collard, Dominique ; Dubois, Emmanuel
Author_Institution :
Institut Supdricur d´´Electroniquc du Nord
Keywords :
Adaptive mesh refinement; Bipolar transistors; Doping; Finite element methods; Mesh generation; Nonhomogeneous media; Oxidation; Silicon; Testing; Voltage;
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
DOI :
10.1109/NUPAD.1990.748290
