• DocumentCode
    2597506
  • Title

    Adaptive Mesh Refinement For Multilayer Process Simulation

  • Author

    Baccus, Bruno ; Collard, Dominique ; Dubois, Emmanuel

  • Author_Institution
    Institut Supdricur d´´Electroniquc du Nord
  • fYear
    1990
  • fDate
    3-4 Jun 1990
  • Firstpage
    87
  • Lastpage
    88
  • Keywords
    Adaptive mesh refinement; Bipolar transistors; Doping; Finite element methods; Mesh generation; Nonhomogeneous media; Oxidation; Silicon; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
  • Type

    conf

  • DOI
    10.1109/NUPAD.1990.748290
  • Filename
    748290
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2597506