DocumentCode
2597813
Title
Standardization of CMOS unit process development
Author
Weber, Charles
Author_Institution
Hewlett-Packard Corp., Palo Alto, CA, USA
fYear
1989
fDate
13-14 March 1989
Firstpage
39
Lastpage
44
Abstract
A multipurpose mask set, consisting of three stepper reticles, contains 95% of all test structures required for complementary metal-oxide semiconductor (CMOS) process development. Techniques, adopted from discrete mathematics, optimally integrate design, processing, parametric test, and data analysis activities. Standard unit processes are discussed. A comprehensive analysis of photolithography is conducted.
Keywords
CMOS integrated circuits; integrated circuit technology; integrated circuit testing; masks; photolithography; standardisation; CMOS unit process development; data analysis; multipurpose mask set; parametric test; photolithography; standardisation; stepper reticles; test structures; Automatic testing; CMOS process; Circuit testing; Data analysis; Dielectrics; Lithography; Probes; Software testing; Software tools; Standardization;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronic Test Structures, 1989. ICMTS 1989. Proceedings of the 1989 International Conference on
Print_ISBN
0-87942-714-0
Type
conf
DOI
10.1109/ICMTS.1989.39278
Filename
39278
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