• DocumentCode
    2598148
  • Title

    The effect of contact geometry on the value of contact resistivity extracted from Kelvin structures

  • Author

    Findlay, K.W.J. ; Alexander, W.J.C. ; Walton, A.J.

  • Author_Institution
    Dept. of Electr. Eng., Edinburgh Univ., UK
  • fYear
    1989
  • fDate
    13-14 March 1989
  • Firstpage
    133
  • Lastpage
    138
  • Abstract
    A finite-element program that can model arbitrarily shaped contacts has been developed. It is used to evaluate the effects that changes in geometry, specific contact resistivity, sheet resistivity, and the modification of sheet resistivity under the contact have on contact systems. The Kelvin test structure is used to illustrate some of its capabilities. It is shown that the contact area of this test structure is of primary importance. The contact shape has little influence on the extracted value of contact resistance.
  • Keywords
    contact resistance; finite element analysis; metallisation; ohmic contacts; semiconductor-metal boundaries; Kelvin structures; arbitrarily shaped contacts; contact area; contact geometry; contact resistivity; finite-element program; ohmic contacts; sheet resistivity; test structure; Buildings; Conductivity; Contact resistance; Geometrical optics; Geometry; Kelvin; Lithography; Mesh generation; Resistors; Shape;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1989. ICMTS 1989. Proceedings of the 1989 International Conference on
  • Print_ISBN
    0-87942-714-0
  • Type

    conf

  • DOI
    10.1109/ICMTS.1989.39297
  • Filename
    39297