DocumentCode :
2598278
Title :
CMOS process uniformity evaluation through the characterisation of parasitic transistors
Author :
Wilson, D. ; Walton, A.J. ; Robertson, J.M. ; Holwill, R.J.
Author_Institution :
Microfabrication Facility, Edinburgh Univ., UK
fYear :
1989
fDate :
13-14 March 1989
Firstpage :
181
Lastpage :
186
Abstract :
The design and fabrication of several families of parasitic transistors available in a standard CMOS process are discussed, and their application to process control is examined. The transistors are characterized, and their extracted parameters are correlated with those obtained from CMOS devices. From these correlations it is concluded that parasitic transistors can be used to provide a more complete picture of CMOS process variation.
Keywords :
CMOS integrated circuits; integrated circuit technology; process control; CMOS process uniformity; parameter extraction; parasitic transistors; process control; Bipolar transistors; CMOS process; Circuits; Fabrication; Implants; Industrial control; JFETs; Kelvin; MOS devices; MOSFETs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1989. ICMTS 1989. Proceedings of the 1989 International Conference on
Print_ISBN :
0-87942-714-0
Type :
conf
DOI :
10.1109/ICMTS.1989.39306
Filename :
39306
Link To Document :
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