DocumentCode
2599095
Title
Retardation of Dopant Diffusion During Fabrication and Effects Upon Junction Depth and Microelectronic Device Performance
Author
Pemsel, E.R. ; Lytle, W.J. ; Dzimianski, J.W. ; Skinner, S.M.
Author_Institution
Westinghouse Electric Corporation, Aerospace Division, Baltimore, Maryland
fYear
1964
fDate
Sept. 1964
Firstpage
404
Lastpage
420
Keywords
Diodes; Etching; Fabrication; Microelectronics; Photovoltaic systems; Resistors; Silicon; Solar power generation; Surface cleaning; Surface topography;
fLanguage
English
Publisher
ieee
Conference_Titel
Physics of Failure in Electronics, 1964. Third Annual Symposium on the
Conference_Location
Chicago, IL, USA
ISSN
0097-2088
Type
conf
DOI
10.1109/IRPS.1964.362301
Filename
4207655
Link To Document